首页> 外国专利> METHOD FOR CURING SKIN DISEASE CAUSED BY FUNGI BY RAPIDLY DROPPING TEMPERATURE FROM MOST SUITABLE TEMPERATURE FOR FUNGI NOT TO MAKE PROTECTIVE MECHANISM WORK

METHOD FOR CURING SKIN DISEASE CAUSED BY FUNGI BY RAPIDLY DROPPING TEMPERATURE FROM MOST SUITABLE TEMPERATURE FOR FUNGI NOT TO MAKE PROTECTIVE MECHANISM WORK

机译:通过从最合适的温度快速滴落真菌导致真菌引起的皮肤疾病的方法

摘要

PURPOSE: To provide a method for curing dermatomycosis in a short period and at small expense. ;CONSTITUTION: In this method, fungi will be divided into spores for which protective mechanism works and spawns for which protective mechanism doesn't work, and the spawns will be perished by rapidly dropping temperature to a fatal degree. The rapid drop of temperature to a fatal degree will be repeatedly done at regular intervals under a temperature condition good enough for spawns not to make their protective mechanism work, or when such a good temperature condition is created. This method will require only small expense and the disease can be cured in a short period with this method. The method is quite different from previous ones with which no one could say that the disease would be completely cured, and the method is expected to change ideas on dermatomycosis in general.;COPYRIGHT: (C)1997,JPO
机译:目的:提供一种在短时间内且花费少的治愈皮肤癣菌的方法。 ;组成:采用这种方法,将真菌分为具有保护机制的孢子和不具有保护机制的产卵,并通过迅速降低温度使其达到致命程度而将其消灭。温度会迅速下降到致命的程度,并且必须在足以使产卵无法发挥其保护机制作用的温度条件下,或者在产生这种良好温度条件时,以固定的时间间隔反复进行。这种方法只需要很小的费用,并且这种方法可以在短时间内治愈疾病。该方法与以前的方法有很大的不同,前者没有人能说这种疾病可以完全治愈,而且该方法有望改变总体上关于皮癣病的观念。;版权:(C)1997,JPO

著录项

  • 公开/公告号JPH09327474A

    专利类型

  • 公开/公告日1997-12-22

    原文格式PDF

  • 申请/专利权人 NISHIKAWA WATARU;

    申请/专利号JP19920192636

  • 发明设计人 NISHIKAWA WATARU;

    申请日1992-06-09

  • 分类号A61F7/00;A61F7/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:59:48

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号