Due to microwave plasma CVD modulo the diamond film synthesizer unit

摘要

PURPOSE:To efficiently form a diamond film on a large-area substrate by introducing a microwave into a reaction chamber so that the electric field direction is paralleled with the substrate surface. CONSTITUTION:A gaseous mixture of hydrocarbons and hydrogen or the mixture added, as required, with another additive gas is introduced into the reaction chamber 13 from a gas supply pipe 14, and discharged from an exhaust pipe 15 to keep the reaction chamber 13 at a specified pressure. The substrate 18 is placed on the substrate holder 17 in the reaction chamber 13 with the surface at right angles to the traveling direction W2 of the microwave, and the surface of the substrate 18 is paralleled with the direction of the electric field E2 of the microwave. As a result, a high-power microwave with the uniform electric field E2 is present on the surface of the substrate 18, long-sized plasma is produced, and a uniform diamond film having good crystallinity can be synthesized and formed on the surface of the large-area substrate 18.