Surface figuring of optical surfaces of silicon carbide by photoelectrochemical etching

摘要

A non-contact photoelectrochemical process capable of figuring and finishing precise optical surfaces of silicon carbide (16), including aspheric optical surfaces and computer (32) controlling location and dwell time parameters as part of an automated process. The automated fabrication using this process offers significant costs and performance benefits for the generation and finishing of low scatter, low subsurface damage SiC optical surfaces.