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Active shield for plasma generation for sputtering
Active shield for plasma generation for sputtering
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机译:有源屏蔽罩,用于等离子体溅射
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摘要
A combination coil and shield for a plasma chamber of a semiconductor manufacturing system is provided. The coil seal has a plurality of windings that provide sufficient energy coupling into the plasma and also prevents the deposition material from reaching the second shield disposed behind the first shield.
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