silicon derivatives or 'voice is recorded in the layer of the insulating material in the chemical quality of grinding method

摘要

the implementation of this is composed of the conductive structure and the semiconductor etching method for the location of the point method. in this way, the plasma etching system, and a dog, the aluminum profile to match. the challenge is the structure of water exposed to the stage. good, ring structure composed of aluminum and copper, or (as in the aluminum and the copper t 1 or 4% composed of pure copper, the essence of. in addition, the etching system is good for the state in the process chamber. Cl2 "composed of. pieces of aluminum to the state. the DMAH, the aluminum to be methyl, methyl to control, not because of the methyl group, the message may change because of an ether, methyl ethyl amine methyl to control or AlCl 3 composed of.