Humidity Control Method and Humidity Control Device in Semiconductor Clean Room

摘要

The present invention relates to a humidity control method and a humidity control apparatus for a semiconductor clean room.;Humidity control method of the semiconductor clean room according to the present invention, by adjusting the amount of the wet air and the amount of dry air individually to mix the controlled amount of wet air and dry air with each other to adjust the humidity of the mixed air In addition, the humidity control device of the semiconductor clean room according to the present invention, the first inlet pipe 5 through which the wet air and the second inlet pipe 6 through which the dry air, and the first inlet pipe 5 and Together with each of the second flow pipes (9) and flow rate regulators (9) for adjusting the amount of air passing through the inside of the second intake pipe (6) and the ends of the first intake pipe (5) and the second intake pipe (6) Is connected is made of a mixer 10 for mixing the dry air and wet air with each other.;Therefore, by controlling a large amount of air to any desired humidity, there is an effect that can supply a large amount of air arbitrarily adjusted to the humidity required for the process or the conditions of the clean room.