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A method for measuring at least two unknown physical variables of a single-layer thin film or of the uppermost layer of a multilayer thin film - structure

机译:一种用于测量单层薄膜或多层薄膜的最上层的至少两个未知物理变量的方法-结构

摘要

a method for measuring an unknown size, such as a refractive index, absorption coefficient and the thickness of the top layer of a multilayer thin film structure, which is on a substrate whose refractive index is trained and absorption coefficient are known, a d with the refractive index.the absorption coefficient and the thickness of the other layers except the top layer position or the multilayer thin film structure are known, and at least the refractive index n1, the absorption coefficient k1 and the thickness d1 of the top position is unknown, the step measuring the energy reflexionsgrade, step, setting the functionsthe unknown elements, and the step, the functions of mathematical to solve.
机译:一种测量未知尺寸的方法,该方法包括在折射率被训练且吸收系数已知的基板上的多层薄膜结构的折射率,吸收系数和顶层的未知厚度,以及折射率除了顶层位置或多层薄膜结构外,其他层的吸收系数和厚度是已知的,至少折射率n1,吸收系数k1和顶层的厚度d1是未知的,步骤:测量能量反射的等级,步骤,设置未知元素的功能以及步骤,数学求解的功能。

著录项

  • 公开/公告号DE3936541C2

    专利类型

  • 公开/公告日1998-05-20

    原文格式PDF

  • 申请/专利权人 RICOH CO. LTD. TOKIO/TOKYO JP;

    申请/专利号DE19893936541

  • 发明设计人 ISOBE TAMI YOKOHAMA KANAGAWA JP;

    申请日1989-11-02

  • 分类号G01N21/41;G01N21/55;G02B27/28;G01B11/06;G01N21/21;

  • 国家 DE

  • 入库时间 2022-08-22 02:43:23

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