characterized in that said hydrophobic photosensitive layer comprises as photosensitive acid precursor a non-ionic photosensitive precursor of a sulphonic acid or a non-ionic photosensitive precursor of an optionally partially esterified phosphonic acid or a non-ionic photosensitive precursor of an optionally partially esterified phosphoric acid, the latter phosphonic or phosphoric acid precursors in the absence of an acid-sensitive composition of (a) low molecular weight compound(s)."/>
公开/公告号DE69501030T2
专利类型
公开/公告日1998-06-10
原文格式PDF
申请/专利权人 AGFA GEVAERT NV BE;
申请/专利号DE1995601030T
申请日1995-08-24
分类号G03F7/34;
国家 DE
入库时间 2022-08-22 02:42:19