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Field emission device with suspended gate

机译:带有悬栅的场发射装置

摘要

An electron emitter plate (110) for an FED image display has an extraction (gate) electrode (22) spaced by a dielectric insulating spacer (125) from a cathode electrode including a conductive mesh (18). Arrays (12) of microtips (14) are located in mesh spacings (16), within apertures (26) formed in clusters (23) in extraction electrode (22). Microtips (14) are deposited through the apertures (26). The insulating spacer (125) is etched to undercut electrode (22) to connect apertures, forming a common cavity (141) for microtips (14) within each mesh spacing (16). Support beam structures (143) are deposited onto extraction electrode (22), either separately or simultaneously with formation of the microtips (14). The support beam structures (143) span the cavity (143) to support the extraction electrode (22) above the cathode electrode over cavity (143). The etch-out reduces the dielectric constant factor of gate- to-cathode capacitance in the finished structure. Strengthening the gate (22) with structures (143) enables gate support over the cavity (141).
机译:用于FED图像显示的电子发射器板(110)具有引出(栅)电极(22),该引出(栅)电极由电介质绝缘间隔物(125)与包括导电网(18)的阴极电极隔开。微尖端(14)的阵列(12)位于网状间隔(16)中,在提取电极(22)中的簇(23)中形成的孔(26)内。微尖端(14)通过孔(26)沉积。绝缘隔离物(125)被蚀刻到底切电极(22)以连接孔,从而在每个网格间隔(16)内形成用于微尖端(14)的公共腔(141)。支撑梁结构(143)与微尖端(14)的形成分开地或同时沉积在引出电极(22)上。支撑梁结构(143)横跨空腔(143),以将引出电极(22)支撑在空腔(143)上方的阴极电极上方。蚀刻减少了最终结构中栅极到阴极电容的介电常数因子。用结构(143)加强浇口(22)使得能够在腔体(141)上支撑浇口。

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