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Method and test structure for determining magnetic domain switching field when fabricating patterned exchange biased magnetoresistive (MR) head

机译:制作图案化交换偏置磁阻(MR)磁头时确定磁畴转换场的方法和测试结构

摘要

A method for determining through a test structure a longitudinal magnetic exchange field within a patterned exchange biased magnetoresistive (MR) sensor element. To practice the method, there is first provided a substrate. Formed upon the substrate is a patterned magnetoresistive (MR) layer which has a projected length upon the substrate and a projected width upon the substrate. There is formed at a pair of separated locations over the patterned magnetoresistive (MR) layer a pair of patterned conductor lead layers. The pair of patterned conductor lead layers is separated by a track width of the patterned magnetoresistive (MR) layer, where the track width is smaller than the projected width. There is also formed within the track width and upon the patterned magnetoresistive (MR) layer a minimum of one patterned anti- ferromagnetic layer separated from each patterned conductor lead layer within the pair of patterned conductor lead layers by a minimum of one unpinned width of the patterned magnetoresistive (MR) layer. The patterned magnetoresistive (MR) layer also has a minimum of one pinned width of the patterned magnetoresistive (MR) layer beneath the minimum of one patterned anti-ferromagnetic layer. The projected length, the unpinned width and the pinned width of the patterned magnetoresistive (MR) layer are chosen such that the magnetic domains within the unpinned width and the pinned width are coupled such that they switch jointly in an externally applied magnetic field. Finally, there is measured through the patterned conductor lead layers a resistance change within the patterned magnetoresistive (MR) layer when the patterned magnetoresistive (MR) layer is exposed to the externally applied magnetic field. The invention also contemplates the test structure through which the method of the invention is practiced.
机译:一种用于通过测试结构确定图案化的交换偏置磁阻(MR)传感器元件内的纵向磁场交换的方法。为了实施该方法,首先提供衬底。图案化的磁阻(MR)层形成在基板上,该图案化的磁阻(MR)层在基板上具有投影长度,在基板上具有投影宽度。在图案化的磁阻(MR)层上方的一对分开的位置处形成一对图案化的导体引线层。一对图案化的导体引线层被图案化的磁阻(MR)层的轨道宽度分开,其中轨道宽度小于投影宽度。在磁道宽度内还形成了一个图案化磁阻(MR)层,该图案化反铁磁层中的至少一个与一对图案化导体导线层中的每个图案化导体导线层隔开了至少一个未钉扎宽度,图案化的磁阻(MR)层。图案化的磁阻(MR)层还具有图案化的磁阻(MR)层的至少一个钉扎宽度的最小值,该宽度小于一个图案化的反铁磁层的最小值。选择图案化的磁阻(MR)层的投影长度,未钉扎宽度和钉扎宽度,使得未钉扎宽度和钉扎宽度内的磁畴耦合,使得它们在外部施加的磁场中共同切换。最后,当图案化的磁阻(MR)层暴露于外部施加的磁场时,通过图案化的导体引线层测量在图案化的磁阻(MR)层内的电阻变化。本发明还考虑了通过其实践本发明的方法的测试结构。

著录项

  • 公开/公告号US5703485A

    专利类型

  • 公开/公告日1997-12-30

    原文格式PDF

  • 申请/专利权人 HEADWAY TECHNOLOGIES INC.;

    申请/专利号US19960687903

  • 发明设计人 YIMIN HSU;KOCHAN JU;YIMIN GUO;

    申请日1996-07-29

  • 分类号G01R33/02;H01F10/02;H01L43/00;

  • 国家 US

  • 入库时间 2022-08-22 02:40:33

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