Large-area, high-throughput, high-resolution, scan-and-repeat, projection patterning system employing sub-full mask

摘要

For high-throughput, low-cost manufacturing of electronic modules, it is desirable to use a large-format, 1:1-imaging exposure system. In such a system, it is further desirable to have the capability to pattern a large substrate having multiple segments using a mask of the size of one substrate segment. The substrate is mounted on an x-y stage which moves the substrate with respect to the imaging optics, both within a segment and from segment to segment. For each mask position, moving from one substrate segment to another will result in a significant change in the length or orientation of the optical imaging path. Such problems are eliminated by using, in conjunction with the primary x-y stage, an auxiliary stage which maintains the optical parameters essentially constant for the imaging of different substrate segments. The auxiliary stage in a first embodiment is mounted on the primary x-y stage and is deployed to move the mask to compensate for the primary stage motion required to present the subsequent substrate segment at the imaging location and keep the optical parameters constant. In a second embodiment, the auxiliary stage is configured as an optics stage set mounted orthogonally to the x-y stage and moves components of the projection system to present a different substrate segment at the imaging location while keeping the optical imaging parameters constant. A third embodiment employs auxiliary stages for moving both the mask and the projection optics for greater versatility.