Method for production of SiO.sub.2 glass material having regions changed in light refractive index and SiO.sub.2 glass material produced by the method

摘要

A method for producing a SiO.sub.2 glass material having regions changed in light refractive index is provided which comprises implanting at least 5×10.sup.19 Ge ions/cm.sup.3 into a SiO.sub.2 glass substrate, heat-treating the substrate at a temperature exceeding 300. degree. C., and exposing the substrate to an ultraviolet light. Also provided is a SiO.sub.2 glass material produced by the method.