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Production manner of optical being induced index of refraction change glass material, index of refraction change manner null of optical being induced index of refraction change glass material and glass

机译:光学感应折射率变化玻璃材料的生产方式,折射率变化方式光学感应折射率变化玻璃材料和玻璃的折射率

摘要

PROBLEM TO BE SOLVED: To obtain the subject glass material enabling the elevation of its refractive index by the irradiation of UV light and enabling to induce the large changes of the refractive index with the light by injecting a prescribed ion into a SiO2 substrate by an ion injection method and subsequently applying a specific treatment to the ion-injected substrate. ;SOLUTION: An SiO2 substrate is injected with Ge ions by an ion injection method and subsequently thermally treated. The ions are injected in an amount of preferably ≥5×1019 ions/cm3g, more preferably 1×1020 ions/cm3. The ion- injected substrate is preferably thermally treated at a temperature of 300-1000°C for 23hr. The refractive index of the glass material can be changed by the irradiation of UV light. The source of the irradiated UV light is preferably a laser light (e.g. ArF laser light) having a wavelength of ≤300nm and an energy density of ≥10mJ/cm2.;COPYRIGHT: (C)1997,JPO
机译:要解决的问题:获得一种目标玻璃材料,该材料能够通过紫外线辐照来提高其折射率,并通过将规定的离子注入SiO 2来引起折射率的大变化。 衬底通过离子注入方法,然后对离子注入的衬底进行特定处理。 ;解决方案:通过离子注入方法向SiO 2 衬底注入Ge离子,然后进行热处理。注入离子的量优选为≥5×10 19 离子/ cm 3 g,更优选为1×10 20 离子/ cm 3 。优选将离子注入的衬底在300-1000℃的温度下热处理23小时。玻璃材料的折射率可以通过紫外线的照射而改变。紫外线照射源优选是波长≤300nm,能量密度≥10mJ/ cm 2 的激光(例如ArF激光)。版权:(C)1997,日本特许厅

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