首页> 外国专利> Atomic beam pattern forming method using atomic beam holography

Atomic beam pattern forming method using atomic beam holography

机译:利用原子束全息术的原子束图案形成方法

摘要

A hologram is made up from a one-dimensional or two- dimensional slit array, each slit being formed with an electrode pair or electric wire for generating an electric field or magnetic field within the slit. These electric fields or magnetic fields are each set for each slit so as to confer upon an atomic beam passing through the slits a phase shift corresponding to the target hologram reproduced image, thereby allowing the target hologram image to be easily reproduced by directing the atomic beam perpendicular to the hologram surface. A two- dimensional reproduced image can be obtained by means of a one- dimensional slit array by shifting the reproduction substrate for each one-dimensional reproduced image obtained, or a three-dimensional pattern image can be reproduced by means of a two-dimensional slit array by successively changing the focal length and stacking on a preceding two- dimensional reproduced image the next two-dimensional reproduced image each time a two-dimensional reproduced image is obtained and repeating this procedure.
机译:全息图由一维或二维狭缝阵列组成,每个狭缝形成有电极对或电线,用于在狭缝内产生电场或磁场。分别为每个狭缝设置这些电场或磁场,以使穿过狭缝的原子束赋予与目标全息图再现图像相对应的相移,从而允许通过引导原子束容易地再现目标全息图图像。垂直于全息图表面。通过针对获得的每个一维再现图像移动再现基板,可以通过一维狭缝阵列来获得二维再现图像,或者可以通过二维狭缝来再现三维图案图像。通过连续改变焦距并在每次获得二维再现图像时将下一二维再现图像堆叠在前一个二维再现图像上并重复该过程,来排列阵列。

著录项

  • 公开/公告号US5834769A

    专利类型

  • 公开/公告日1998-11-10

    原文格式PDF

  • 申请/专利权人 NEC CORPORATION;

    申请/专利号US19970895273

  • 申请日1997-07-16

  • 分类号H01J37/302;

  • 国家 US

  • 入库时间 2022-08-22 02:38:13

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号