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PHOTOOXIDATION TREATMENT APPARATUS OF WATER TREATMENT EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT, WATER TREATMENT EQUIPMENT WITH THE SAME, AND TREATING METHOD FOR WATER
PHOTOOXIDATION TREATMENT APPARATUS OF WATER TREATMENT EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT, WATER TREATMENT EQUIPMENT WITH THE SAME, AND TREATING METHOD FOR WATER
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机译:用于制造半导体元件的水处理设备的光氧化处理装置,具有该装置的水处理设备以及水的处理方法
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摘要
PROBLEM TO BE SOLVED: To provide a photooxidation treatment apparatus of a water treatment equipment for manufacturing a semiconductor element by which the reliability and productivity of the semiconductor element are improved, and to provide a water treatment equipment provided with the photooxidation treatment apparatus, and a treating method for water. ;SOLUTION: A photooxidation treatment apparatus is provided with a UV lamp 20 which radiates UV rays to oxidize organic substances contained in pre-treated water, a photooxidation part 22 which houses the UV lamp 20 and makes water flow, a catalyst part 30 which is installed on a inside wall of the photooxidation part and activates oxidation of the organic substances at the UV radiation. The water treatment equipment with the photooxidation treatment apparatus is provided with a first photooxidation treatment apparatus, a second photooxidation treatment apparatus, a second ion exchange apparatus, and a particle treatment apparatus. Therefore, the reliability and productivity of a semiconductor element can be improved by completely treating organic substances contained in the water.;COPYRIGHT: (C)1999,JPO
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