首页> 外国专利> PHOTOOXIDATION TREATMENT APPARATUS OF WATER TREATMENT EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT, WATER TREATMENT EQUIPMENT WITH THE SAME, AND TREATING METHOD FOR WATER

PHOTOOXIDATION TREATMENT APPARATUS OF WATER TREATMENT EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR ELEMENT, WATER TREATMENT EQUIPMENT WITH THE SAME, AND TREATING METHOD FOR WATER

机译:用于制造半导体元件的水处理设备的光氧化处理装置,具有该装置的水处理设备以及水的处理方法

摘要

PROBLEM TO BE SOLVED: To provide a photooxidation treatment apparatus of a water treatment equipment for manufacturing a semiconductor element by which the reliability and productivity of the semiconductor element are improved, and to provide a water treatment equipment provided with the photooxidation treatment apparatus, and a treating method for water. ;SOLUTION: A photooxidation treatment apparatus is provided with a UV lamp 20 which radiates UV rays to oxidize organic substances contained in pre-treated water, a photooxidation part 22 which houses the UV lamp 20 and makes water flow, a catalyst part 30 which is installed on a inside wall of the photooxidation part and activates oxidation of the organic substances at the UV radiation. The water treatment equipment with the photooxidation treatment apparatus is provided with a first photooxidation treatment apparatus, a second photooxidation treatment apparatus, a second ion exchange apparatus, and a particle treatment apparatus. Therefore, the reliability and productivity of a semiconductor element can be improved by completely treating organic substances contained in the water.;COPYRIGHT: (C)1999,JPO
机译:解决的问题:提供一种用于制造半导体元件的水处理设备的光氧化处理设备,通过该光氧化处理设备提高半导体元件的可靠性和生产率,并且提供一种配备有该光氧化处理设备的水处理设备,以及一种水处理设备。水的处理方法。 ;解决方案:一种光氧化处理装置,包括:紫外线灯20,其发出紫外线以氧化预处理水中所含的有机物;光氧化部22,其容纳紫外线灯20并使水流动;催化剂部30,其为安装在光氧化部分的内壁上,并在紫外线辐射下激活有机物质的氧化。带有光氧化处理设备的水处理设备包括第一光氧化处理设备,第二光氧化处理设备,第二离子交换设备和颗粒处理设备。因此,通过完全处理水中所含的有机物,可以提高半导体元件的可靠性和生产率。版权所有:(C)1999,JPO

著录项

  • 公开/公告号JPH11188357A

    专利类型

  • 公开/公告日1999-07-13

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRON CO LTD;

    申请/专利号JP19980202520

  • 申请日1998-07-17

  • 分类号C02F1/32;B01J21/06;B01J35/02;C02F1/20;C02F1/28;C02F1/42;C02F1/44;C02F1/72;H01L21/304;

  • 国家 JP

  • 入库时间 2022-08-22 02:37:49

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