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TARGET FOR FORMING STRONTIUM TITANATE THIN COATING, ITS PRODUCTION AND FORMATION OF STRONTIUM TITANATE THIN COATING
TARGET FOR FORMING STRONTIUM TITANATE THIN COATING, ITS PRODUCTION AND FORMATION OF STRONTIUM TITANATE THIN COATING
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机译:钛酸锶薄膜的形成靶材,钛酸锶薄膜的生产与成膜
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摘要
PROBLEM TO BE SOLVED: To produce a target for forming strontium titanate thin coating capable of increasing the relative permittivity of the formed SrTiO3 thin coating to about 50 to 100 even if the substrate temp. at the time of sputtering is ≤200°C, to provide a method therefor and to provide a method for forming strontium titanate thin coating high in relative permittivity by using this target for forming strontium titanate thin coating. ;SOLUTION: Relating to the target for forming strontium titanate thin coating the compositional formula is expressed by SrTiO3 ±δ in the case the excess and deficiency of oxygen from the stoichiometric compsn. of strontium titanate is defined as δ, where δ is ≤0.020. This target for forming thin coating can be produced by baking a strontium titanate thin molded body at 1200 to 1350°C for 3 to 14 hr in the air or in oxygen to obtain a baked body expressed by the compositional formula of SrTiO3±δ in the case the excess and deficiency of oxygen from the stoichiometric compsn. of strontium titanate is defined as δ, where δ is ≤0.020.;COPYRIGHT: (C)1999,JPO
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