首页> 外国专利> TARGET FOR FORMING STRONTIUM TITANATE THIN COATING, ITS PRODUCTION AND FORMATION OF STRONTIUM TITANATE THIN COATING

TARGET FOR FORMING STRONTIUM TITANATE THIN COATING, ITS PRODUCTION AND FORMATION OF STRONTIUM TITANATE THIN COATING

机译:钛酸锶薄膜的形成靶材,钛酸锶薄膜的生产与成膜

摘要

PROBLEM TO BE SOLVED: To produce a target for forming strontium titanate thin coating capable of increasing the relative permittivity of the formed SrTiO3 thin coating to about 50 to 100 even if the substrate temp. at the time of sputtering is ≤200°C, to provide a method therefor and to provide a method for forming strontium titanate thin coating high in relative permittivity by using this target for forming strontium titanate thin coating. ;SOLUTION: Relating to the target for forming strontium titanate thin coating the compositional formula is expressed by SrTiO3 ±δ in the case the excess and deficiency of oxygen from the stoichiometric compsn. of strontium titanate is defined as δ, where δ is ≤0.020. This target for forming thin coating can be produced by baking a strontium titanate thin molded body at 1200 to 1350°C for 3 to 14 hr in the air or in oxygen to obtain a baked body expressed by the compositional formula of SrTiO3±δ in the case the excess and deficiency of oxygen from the stoichiometric compsn. of strontium titanate is defined as δ, where δ is ≤0.020.;COPYRIGHT: (C)1999,JPO
机译:要解决的问题:制备用于形成钛酸锶薄膜的靶材,该靶材即使在基板温度下也能将所形成的SrTiO 3 薄膜的相对介电常数提高到约50至100。溅射时的温度≤200℃时,提供该方法,并提供通过使用该靶形成钛酸锶薄涂层而形成相对介电常数高的钛酸锶薄涂层的方法。 ;解决方案:关于化学计量成分中氧气过量和不足的情况,关于形成钛酸锶薄膜涂层的目标,其组成式由SrTiO3±δ表示。钛酸锶的δ定义为δ,其中δ≤0.020。该形成薄涂层的靶可以通过在空气或氧气中在1200至1350℃下将钛酸锶锶薄成型体焙烧3至14小时来获得,以得到由SrTiO3±δ的组成式表示的焙烧体。情况下,化学计量成分中的氧气过量和不足。钛酸锶的含量定义为δ,其中δ≤0.020.;版权所有:(C)1999,日本特许厅

著录项

  • 公开/公告号JPH11158611A

    专利类型

  • 公开/公告日1999-06-15

    原文格式PDF

  • 申请/专利权人 HITACHI METALS LTD;

    申请/专利号JP19970320758

  • 发明设计人 MURAKAMI SHIRO;SAKAKIBARA MASAHIKO;

    申请日1997-11-21

  • 分类号C23C14/34;C04B35/46;C23C14/08;H01G4/33;H01G4/12;H01L21/31;

  • 国家 JP

  • 入库时间 2022-08-22 02:37:30

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