CONTACT FILM BARRIER FILM CONTINUOUSLY FORMING EQUIPMENT AND DIFFERENT KIND THIN FILM CONTINUOUSLY FORMING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To enable continuously forming, in a vacuum, a different kind of thin film like a contact film barrier film with sufficient covering property, on the inner surface of a hole having a high aspect ratio. ;SOLUTION: A sputtering chamber 2 forming a contact film and a CVD chamber 3 forming a barrier film on the contact film are hermetically connected via a separation chamber 1. The separation chamber 1 is provided with a carrying mechanism 11 carrying a substrate 9 in a vacuum, an inert gas introducing system introducing inert gas to the inside, and a control part opening a gate valve after confirming that the pressure in the separation chamber 1 is higher than the pressure of the CVD chamber 3, and the residual gas of the CVD chamber 3 becomes at most a specified level.;COPYRIGHT: (C)1999,JPO