METHOD FOR DETECTING OPTICAL SYSTEM ABERRATION IN PROJECTION ALIGNER AND LEVENSON TYPE PHASE SHIFT MASK FOR DETECTING OPTICAL SYSTEM ABERRATION

摘要

PROBLEM TO BE SOLVED: To easily perform the detection of coma aberration at a fine pattern which is ≤0.2 μm. ;SOLUTION: By using a Levenson type phase shift mask as an exposure mask, a reduced transfer pattern formed on a photosensitive substrate by reducing a mask pattern provided at the Levenson type phase shift mask at a specified reduction ratio and transferring it on the photosensitive substrate by using a projection aligner and the reduced mask pattern obtained by reducing the mask pattern of the Levenson type phase shift mask at the reduction ratio same as that of the projection aligner are compared, so that the optical system coma aberration of the projection aligner is detected. The correction of a mask or the adjustment of the optical system aberration of the aligner is performed in accordance with the coma aberration detected.;COPYRIGHT: (C)1999,JPO