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Production method null of modifier and chip resistance polystyrene resin composition for polystyrene type resin

机译:用于聚苯乙烯类树脂的改性剂和抗崩裂性聚苯乙烯树脂组合物的生产方法无效

摘要

PURPOSE:To obtain an impact-resistant polystyrene resin composition improved in mold release in molding, abrasion resistance, lubricity, etc., by reacting a maleic anhydridemodified PS elastomer with a polysiloxane reactive therewith in the presence of PS or a styrene copolymer resin. CONSTITUTION:5-30wt.% maleic anhydride-modified PS elastomer (A) prepared by selectively hydrogenating the polybutadiene segment of a styrene/butadiene block copolymer desirably having at least one PS segment and at least one polybutadiene segment and graft-modifying the product with maleic anhydride is reacted by melt kneading with 5-50wt.% polysiloxane (B) desirably having an amino-containing substituent on at least either end and a group reactive with component A in the presence of 20-90wt.% PS or styrene copolymer resin (C).
机译:用途:通过在PS或苯乙烯共聚物树脂的存在下使马来酸酐改性的PS弹性体与与其反应的聚硅氧烷反应,获得在模塑中脱模,耐磨性,润滑性等方面改善的耐冲击聚苯乙烯树脂组合物。组成:5-30wt。%的马来酸酐改性的PS弹性体(A),其通过选择性地氢化期望具有至少一个PS链段和至少一个聚丁二烯链段的苯乙烯/丁二烯嵌段共聚物的聚丁二烯链段并用接枝改性产物而制备。在20-90wt。%的PS或苯乙烯共聚物树脂的存在下,通过与5-50wt。%的聚硅氧烷(B)熔融捏合来反应马来酸酐,所述聚硅氧烷(B)在至少一个末端上具有至少一个末端上的氨基和与组分A具有反应性的基团。 (C)。

著录项

  • 公开/公告号JP2832468B2

    专利类型

  • 公开/公告日1998-12-09

    原文格式PDF

  • 申请/专利权人 CHITSUSO KK;

    申请/专利号JP19890308251

  • 申请日1989-11-28

  • 分类号C08G81/02;C08L25/04;

  • 国家 JP

  • 入库时间 2022-08-22 02:28:32

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