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METHOD FOR THE ELECTROLYTIC DEPOSITION OF METALS FROM ELECTROLYTE WITH PROCESS ORGANIC

机译:有机过程从电解质中电解沉积金属的方法

摘要

The invention concerns a method of electrolytically depositing metals from electrolytes containing organic additives designed to give particular physical properties. Such additives are continuously lost during galvanization, resulting in the formation of decomposition products which spread throughout the whole galvanization plant and are thus deposited on the articles being galvanized. The aim of the invention is therefore to avoid defects in the deposited layers caused by organic residues, thus ensuring continuous deposition of the metal and uniform quality of the metal layers produced. This aim is achieved by physically limiting the organic additives to that part of the electrolyte in which they are relevant. The electrolyte is cycled through a filter in order to keep it free of organic additives. Topping up with organic additives is carried out as a function of additive losses immediately outside that part of the electrolyte in which the additives are relevant.
机译:本发明涉及一种从含有设计成具有特定物理性能的有机添加剂的电解质中电解沉积金属的方法。这样的添加剂在镀锌过程中连续损失,导致形成分解产物,这些分解产物遍布整个镀锌工厂,并因此沉积在被镀锌的物品上。因此,本发明的目的是避免由有机残余物引起的沉积层中的缺陷,从而确保金属的连续沉积和所生产的金属层的均匀质量。通过将有机添加剂物理地限制在与它们相关的电解质的那部分中来实现该目的。使电解质循环通过过滤器,以使其不含有机添加剂。根据添加剂损耗的变化,立即在与电解质相关的那部分电解质外部添加有机添加剂。

著录项

  • 公开/公告号AT181118T

    专利类型

  • 公开/公告日1999-06-15

    原文格式PDF

  • 申请/专利权人 ATOTECH DEUTSCHLAND GMBH;

    申请/专利号AT19950912124T

  • 发明设计人 SCHNEIDER REINHARD;

    申请日1995-02-23

  • 分类号C25D21/06;C25D3/02;C25D21/18;

  • 国家 AT

  • 入库时间 2022-08-22 02:24:51

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