首页> 外国专利> Method and apparatus for manufacturing high-purity chemical for microelectronic device industry

Method and apparatus for manufacturing high-purity chemical for microelectronic device industry

机译:用于微电子设备行业的高纯度化学品的制造方法和设备

摘要

The present invention relates to a method for producing a high purity liquid chemical that can be used in the microelectronic industry, which method comprises gradually introducing impurities into an aqueous solution of an initially deionized (deionized) high purity, And passing through the column to continuously purify the chemical gas and the gas leaves the second purification column at a high purity with a particularly low content of metal elements and the purified gas is then collected at the bottom of the column and purified Dissolving in a packed column in which the liquid enriched with the chemical gas is continuously recycled, and then distributing the high purity chemical when the concentration of the dissolved gas is reached.
机译:本发明涉及一种可用于微电子工业的高纯度液体化学品的生产方法,该方法包括将杂质逐渐引入到初始去离子(去离子)高纯度的水溶液中,并通过该塔连续地进行。纯化化学气体,然后气体以高纯度离开第二纯化塔,其中金属元素的含量特别低,然后将纯化后的气体收集在塔底并纯化。将其溶解在填充塔中,在其中填充了化学气体不断循环,然后在达到溶解气体的浓度时分配高纯度化学物质。

著录项

  • 公开/公告号KR19980081289A

    专利类型

  • 公开/公告日1998-11-25

    原文格式PDF

  • 申请/专利权人 다니엘라벨르;

    申请/专利号KR19980012760

  • 发明设计人 띠에리래더리크;헤르베덜피;

    申请日1998-04-10

  • 分类号B01F3/00;

  • 国家 KR

  • 入库时间 2022-08-22 02:19:01

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号