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Manufacturing equipment of semiconductor device and wafer access method to this equipment

机译:半导体装置的制造设备以及对该设备的晶圆存取方法

摘要

The present invention discloses a manufacturing apparatus for a semiconductor device and a wafer access method for the apparatus. The present invention includes a pressure buffer means in a chamber, such as a load lock chamber, of a manufacturing facility in a semiconductor device. The pressure buffer means may be constituted by a valve, a filter, or a combination thereof. By the pressure buffer means, the inside and outside of the load lock chamber can be thermodynamically balanced. Therefore, in the case where the wafer enters the load lock chamber from the wafer cassette or vice versa, vortices caused by the pressure difference between the two regions can be prevented, so that particle contamination of the wafer due to the vortices can be prevented.
机译:本发明公开了一种用于半导体器件的制造设备和用于该设备的晶片存取方法。本发明包括在半导体器件中的制造设备的腔室中的压力缓冲装置,例如负载锁定腔室。压力缓冲装置可以由阀,过滤器或其组合构成。通过压力缓冲装置,负载锁定室的内部和外部可以热力学平衡。因此,在晶片从晶片盒进入装载锁定室的情况下,反之亦然,可以防止由两个区域之间的压力差引起的涡流,从而可以防止由于涡流引起的晶片颗粒污染。

著录项

  • 公开/公告号KR19990032973A

    专利类型

  • 公开/公告日1999-05-15

    原文格式PDF

  • 申请/专利权人 윤종용;

    申请/专利号KR19970054198

  • 发明设计人 이혁준;백재학;

    申请日1997-10-22

  • 分类号H01L21/68;

  • 国家 KR

  • 入库时间 2022-08-22 02:17:21

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