Exposure apparatus and measuring method of illuminance uniformity and parallelism of stage motion

摘要

According to the invention, the light source; A projection optical system for injecting light from the light source through a predetermined light path; A reticle stage capable of supporting and transporting a reticle having a predetermined pattern thereon; An exposure apparatus comprising a plate stage capable of supporting and transferring a plate to be exposed thereon, the exposure apparatus comprising a plurality of light detection sensors provided on the plate stage, and parallelism and illuminance uniformity measurement of the exposure apparatus. A method is provided. In the present invention, measurement of parallelism and roughness uniformity can be performed quickly, accurately and reliably.