FARADAY-CUP ASSEMBLY AND FARADAY VOLTAGE CONTROL METHOD OF ION IMPLANTER

摘要

The present invention relates to a Faraday cup assembly of an ion implantation facility to suppress secondary electrons generated from a wafer mounted on a disk placed in front of a Faraday cup, which biases a bias plate to which a Faraday voltage is applied from a bias power source. Connected to the capacitor so that the Faraday voltage is fed back to the bias power supply, and the bias power supply is configured to adjust the Faraday voltage applied to the bias plate according to the level of the Faraday voltage being fed back to precisely regulate the Faraday voltage supplied to the bias plate. It can be.