首页> 外国专利> TRANSMISSIVE MASK FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND AN EXPOSURE APPARATUS USING SUCH A TRANSMISSION MASK

TRANSMISSIVE MASK FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND AN EXPOSURE APPARATUS USING SUCH A TRANSMISSION MASK

机译:带电粒子束曝光装置的透射面罩以及使用这种透射面罩的曝光装置

摘要

A transmission mask for a charged particle beam exposure apparatus of the present invention comprises: a mask substrate having a plurality of openings provided in the form of a matrix and having a pair of deflection electrodes provided in each opening on one surface; And a beam blocking layer provided on another surface of the mask substrate and having a transmittance of a beam larger than that of the mask substrate. The transmission mask is installed in the apparatus to direct the beam blocking layer to a beam gun to prevent an increase in temperature due to the beam irradiation.
机译:本发明的带电粒子线曝光装置的透射掩模包括:掩模基板,该掩模基板具有以矩阵状设置的多个开口,并且在一个面上的每个开口中设置有一对偏转电极。光束阻挡层设置在掩模基板的另一面上,并且具有比掩模基板大的光束的透射率。透射掩模安装在设备中,以将光束阻挡层引导至光束枪,以防止由于光束照射而引起的温度升高。

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