Magnet array structure of magnet assembly for semiconductor aluminum deposition equipment

摘要

The present invention relates to a magnet arrangement structure of a magnet assembly for semiconductor aluminum deposition equipment. In the related art, a lot of lotion is generated on the outside of a target, thereby deteriorating the uniformity of the deposited film thickness of the wafer. The magnet array structure of the magnet assembly 14 for semiconductor aluminum deposition equipment of the present invention is provided with a long-axis magnet 12 at a predetermined interval on the outer side of the magnet fixing plate 11 having a wide width, and a single-axis magnet 12 'on the inside. Although installed between the long-axis magnets 12 to form a uniform magnetic field, a uniform lotion is generated in the target, thereby improving the deposition thickness uniformity of the wafer.