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Electrolyte for low-stress, crack-free ruthenium coatings
Electrolyte for low-stress, crack-free ruthenium coatings
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机译:用于低应力,无裂纹的钌涂层的电解质
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摘要
Pyridine or N-alkylated pyridinium salts are components of electrolytes containing ruthenium in the form of a sulfamic acid complex, for the electrolytic deposition of low-stress, crack-free ruthenium coatings. An electrolyte for the deposition of low-stress, crack-free ruthenium (Ru) coatings contains Ru in the form of a sulfamic acid complex and also pyridine or N-alkylated pyridinium salts of formula (I) R- = -(CH2)3-SO3-, -CH2-CHOH-CH2-SO3- or -CH2C6H5 Cl-; R1 = H, 1-6C alkyl, vinyl or -COONa Independent claims are also included for (a) a process for the production of this electrolyte by adding pyridine or a salt (I) to an aqueous acid solution containing Ru as a sulfamic acid complex; (b) a process for the production of low-stress, crack-free Ru coatings by the cathodic deposition of Ru from this electrolyte.
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机译:吡啶或N-烷基化吡啶鎓盐是含有氨基磺酸形式的钌的电解质的成分,用于电解沉积低应力,无裂纹的钌涂层。用于沉积低应力,无裂纹的钌(Ru)涂层的电解质包含氨基磺酸形式的Ru,以及通式为(I)的吡啶或N-烷基化吡啶鎓盐R- =-(CH2 )3-SO3-,-CH 2 -CHOH-CH 2 -SO 3-或-CH 2 C 6 H 5 Cl-; R 1 = H,1-6C烷基,乙烯基或-COONa。(a)通过将吡啶或盐(I)加入到含有Ru作为溶剂的酸性水溶液中来制备该电解质的方法,也包括独立权利要求。氨基磺酸络合物; (b)通过从该电解质阴极沉积Ru来生产低应力,无裂纹的Ru涂层的方法。
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