首页> 外国专利> METHOD FOR CONTROLLING AT LEAST ONE IGBT-TYPE TRANSISTOR CAPABLE OF ALLOWING THEIR OPERATION UNDER IRRADIATION

METHOD FOR CONTROLLING AT LEAST ONE IGBT-TYPE TRANSISTOR CAPABLE OF ALLOWING THEIR OPERATION UNDER IRRADIATION

机译:辐照下允许其工作的至少一个IGBT型晶体管的控制方法

摘要

The present invention relates to a method for controlling at least one transistor of the IGBT type capable of enabling it to operate under irradiation, in which the threshold value Vges of the gate-emitter voltage of a first IGBT transistor is measured ( 30) under irradiation and the voltage applied in operation between gate and emitter of the at least one second IGBT transistor is varied in irradiation so as to control the threshold voltage Vges of this second IGBT transistor (s) to a set value despite the drift caused by the irradiation. /P
机译:本发明涉及一种用于控制至少一个能够使其在辐照下工作的IGBT类型的晶体管的方法,其中在辐照下测量(30)第一IGBT晶体管的栅极-发射极电压的阈值Vges。并且在照射中改变在至少一个第二IGBT晶体管的栅极和发射极之间的操作中施加的电压,从而尽管受到照射引起的漂移,但是也将第二IGBT晶体管的阈值电压Vges控制为设定值。

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