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Charged-particle-beam exposure method with temperature- compensated exposure to offset expansion and contraction of substrate
Charged-particle-beam exposure method with temperature- compensated exposure to offset expansion and contraction of substrate
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机译:带温度补偿曝光的带电粒子束曝光方法,可补偿基材的膨胀和收缩
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摘要
Apparatus and methods are disclosed for increasing the throughput and accuracy of a charged-particle-beam (CPB) exposure apparatus. The apparatus comprises a CPB optical system for exposing a pattern onto a sensitive substrate in a vacuum chamber. During exposure, the substrate is placed on a movable stage. If the substrate temperature is not equal to the exposure-environment temperature, calibrated data on a temperature- correction factor of the substrate is obtained and used to convert XY coordinates for an exposure-environment temperature exposure of the substrate into corrected XY coordinates for exposure at the actual substrate temperature. Exposure of the substrate is positionally accurate even if, after exposure, the substrate undergoes expansion or contraction as the substrate equilibrates with the exposure-environment temperature.
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