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Generation of a loose planarization mask having relaxed boundary conditions for use in shallow trench isolation processes
Generation of a loose planarization mask having relaxed boundary conditions for use in shallow trench isolation processes
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机译:具有宽松边界条件的宽松平面化掩模的生成,用于浅沟槽隔离工艺
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摘要
A method of forming an improved planarization mask for shallow trench isolation process area in integrated circuit manufacturing is disclosed. The planarization mask is generated automatically by using actual mask data as a reference. The invention discloses an algorithm which measures the geometric and relative separation distances of the active areas and performs the necessary merging, deletion and differential biasing to produce the planarization mask which has relaxed geometric boundaries, thereby allowing low cost and simplified manufacturing.
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