首页>
外国专利>
Micromachined probes for nanometer scale measurements and methods of making such probes
Micromachined probes for nanometer scale measurements and methods of making such probes
展开▼
机译:用于纳米级测量的微机械探针及其制造方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A submicrometer photodiode probe with a sub-50 nanometer tip radius is used for optical surface characterization on a nanometer scale. The nanoprobe detects subwavelength optical intensity variations in the near field of an illuminated surface. The probe comprises a metal- semiconductor Schottky diode that is constructed at the end of a micromachined tip of a semiconductor wafer. A process is disclosed for micromachining the tip of the semiconductor wafer and then of creating a photodiode at the tip, with the photodiode having an optical aperture of a size less than 1000 nanometers.
展开▼