Using (LaNiO.sub.3) .sub.X (TiO.sup.2) .sub.1-X and (LaNiO.sub.3) . sub.X (Ta.sub.2 O.sub.5) .sub.1-X oxide absorption composites for attenuating phase shifting blanks and masks

摘要

An attenuating phase shifting photomask is formed using attenuating phase shifting composite material combining the optical properties of a first material having a high extinction coefficient and a second material having a high index of refraction. The first material is LaNiO.sub.3 and the second material is either TiO.sub.2 or Ta.sub.2 O. sub.5. The first and second materials are combined to produce composites of either (LaNiO. sub.3).sub.x (TiO.sub.2).sub.1-x or (LaNiO.sub.3).sub.x (Ta.sub.2 O.sub.5) .sub.1-x to form attenuating phase shifting blanks and masks. Co- deposition of LaNiO.sub.3 and either TiO.sub.2 or Ta.sub.2 O. sub.5 uses rf-magnetron sputtering to form the (LaNiO.sub.3).sub.x (TiO. sub.2).sub. 1-x or (LaNiO.sub.3).sub.x (Ta.sub.2 O.sub.5).sub.1-x films on a transparent quartz substrate.