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Opposition target type spatter manner and opposition target type spatter device

机译:敌对目标式飞溅方式和对峙目标式飞溅装置

摘要

PURPOSE: To provide an opposed target type sputtering method used for the production of a magnetic tape, a magnetic floppy disk or the like and improving the reliability and productivity of the product and to provide a device therefor. ;CONSTITUTION: This device is provided with opposed circular targets 1a and 2a and rotating drums 3 and 4 rotating synchronously along their outer circumferences, and the space between the targets 1a and 2a is present at the inside of the space between the rotating drums 3 and 4. A film 5 coiled around the rotating drums 3 and 4 runs around the targets 1a and 2a in such a manner that the space between the targets 1a and 2a is coated in accordance with the rotation of the rotating drums 3 and 4, electric power is fed to the targets 1a and 2a, and sputtering is executed to the surface of the film 5.;COPYRIGHT: (C)1996,JPO
机译:用途:提供一种用于生产磁带,软盘等的相对靶材类型的溅射方法,并提高产品的可靠性和生产率,并为此提供一种装置。 ;组成:该装置配备有相对的圆形靶1a和2a以及沿其外周同步旋转的旋转鼓3和4,靶1a和2a之间的空间位于旋转鼓3和2之间的空间内部。 4.缠绕在旋转鼓3和4上的膜5以围绕靶1a和2a的方式运行,使得靶1a和2a之间的空间根据旋转鼓3和4的旋转而被涂覆。将其送入靶1a和2a,并在膜5的表面上进行溅射;版权:(C)1996,JPO

著录项

  • 公开/公告号JP3106456B2

    专利类型

  • 公开/公告日2000-11-06

    原文格式PDF

  • 申请/专利权人 日本ビクター株式会社;

    申请/专利号JP19940290648

  • 发明设计人 杉山 正彦;

    申请日1994-10-31

  • 分类号C23C14/34;G11B5/84;G11B5/851;

  • 国家 JP

  • 入库时间 2022-08-22 02:05:25

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