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Opposition target type spatter manner and opposition target type spatter device
Opposition target type spatter manner and opposition target type spatter device
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机译:敌对目标式飞溅方式和对峙目标式飞溅装置
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摘要
PURPOSE: To provide an opposed target type sputtering method used for the production of a magnetic tape, a magnetic floppy disk or the like and improving the reliability and productivity of the product and to provide a device therefor. ;CONSTITUTION: This device is provided with opposed circular targets 1a and 2a and rotating drums 3 and 4 rotating synchronously along their outer circumferences, and the space between the targets 1a and 2a is present at the inside of the space between the rotating drums 3 and 4. A film 5 coiled around the rotating drums 3 and 4 runs around the targets 1a and 2a in such a manner that the space between the targets 1a and 2a is coated in accordance with the rotation of the rotating drums 3 and 4, electric power is fed to the targets 1a and 2a, and sputtering is executed to the surface of the film 5.;COPYRIGHT: (C)1996,JPO
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