Passivation treatment method of the excimer laser device

摘要

PURPOSE:To provide a passivation treatment method for an excimer laser device so as to most effectively restrain it from deteriorating in laser medium gas. CONSTITUTION:In an excimer laser device, where laser medium gas is made to circulate in the device to enable an electrode to start discharging by excitation to generate laser rays, a part of the device coming into contact with laser medium gas is treated with halogen gas or halogen compound gas 1 to 50% in concentration at a temperature of 40-80 deg.C, whereby a passivation film is formed on the part concerned.