PURPOSE: To lower the wearing speed of a filament by reducing the rate of sputter onto the filament. ;CONSTITUTION: An aux. discharge chamber bulkhead 6 in cylindrical form is provided inside a main arc chamber 1 defined by a main arc chamber bulkhead 3, and thereby a low arc voltage discharge chamber 2 is formed, and inside thereof a filament 8 is installed. The main arc chamber bulkhead 3 is electrically insulated from the aux. discharge chamber bulkhead 6, which is connected with an arc power supply 4 through a resistance 7. Because electrons of arc discharge flow to the arc power supply 5 from the aux. discharge chamber bulkhead 6 via the resistance 7, the voltage of the aux. discharge chamber bulkhead 6 sinks, which drops the energy of impurity ions in the plasma in the low arc voltage discharge chamber 2.;COPYRIGHT: (C)1993,JPO&Japio
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