Emitter diffusion time management manner and emitter diffusion time management system

摘要

PROBLEM TO BE SOLVED: To control the hFE value accurately by specifying the relationship of the emitter diffusion time in an emitter diffusion furnace obtained from the base low S value and the emitter low S value of a semiconductor and the required hFE value, and automatically computing the optimum emitter diffusion by one time by using this relationship. ;SOLUTION: The relationship of a base low S value of a semiconductor, which is measured in the process before the processing in an emitter diffusion furnace, an emitter low S value computed from the base low S value and the emitter diffusing time at every emitter diffusing furnace obtained from the hFE value is enciphered by the expression 1, the expression 2 and the expression 3. Then, the relationship is stored in a master-condition memory device, and the master condition for every product is provided. By using the relationship, where the master condition, the base low S value and the processing result for every emitter diffusing furnace are enciphered, the optimum emitter diffusing time is automatically computed by one time in a host computer.;COPYRIGHT: (C)2000,JPO