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QUANTUM DOT SOLID AND PATTERNING METHOD FOR CONVENTIONAL TYPE SOLID

机译:常规点状固体的量子点滴定及配制方法

摘要

PROBLEM TO BE SOLVED: To obtain an easy and flexible manufacturing method for a material made into a three-dimensional pattern in nanometer length scale by providing a process forming quantum dot solid from nanocrystal within a hole of a template.;SOLUTION: Colloidal nanocrystal is reduced in layer into a prescribed three- dimensional pattern as closet packed nanocrystal in a hole of a template 70. By utilizing colloidal nanocrystal solution including at least one kind of solvent, all of one kind or more solvents of colloidal nanocrystal solution are evaporated and quantum dot solid is formed within the hole of the template 70. By slowly evaporating one kind or more solvents, non-stabilization of colloid is slowly advanced and nanocrystal is stuck and coagulated by a way with suppression. At the time of terminating an evaporation process, the hole of the template 70 is filled with quantum dot solid 60 made of closest packed nanocrystal 40. Therefore, quantum dot solid is a substance material in which a basic constituting block is nanocrystal.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:通过提供在模板的孔内由纳米晶体形成量子点固体的工艺,来获得一种容易且灵活的制造成纳米级尺寸的三维图案的材料的制造方法。在模板70的孔中将层减少为预定的三维图案,作为密堆积纳米晶体。通过利用包括至少一种溶剂的胶态纳米晶体溶液,一种或多种胶态纳米晶体溶液的所有溶剂被蒸发并量子化在模板70的孔内形成点固体。通过缓慢地蒸发一种或多种溶剂,胶体的非稳定化缓慢进行,并且通过抑制的方式使纳米晶体粘附并凝结。在终止蒸发过程时,模板70的孔中填充了由紧密堆积的纳米晶体40制成的量子点固体60。因此,量子点固体是其中基本构成嵌段是纳米晶体的物质材料。日本特许(C)2000

著录项

  • 公开/公告号JP2000108100A

    专利类型

  • 公开/公告日2000-04-18

    原文格式PDF

  • 申请/专利权人 NEC CORP;

    申请/专利号JP19990101120

  • 发明设计人 YURY VLASOV;DAVID NORRIS;

    申请日1999-04-08

  • 分类号B82B3/00;H01L21/368;

  • 国家 JP

  • 入库时间 2022-08-22 02:02:07

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