FORMATION OF MULTILAYERED OPTICAL THIN FILMS AND APPARATUS FOR FORMING MULTILAYERED OPTICAL THIN FILMS

摘要

PROBLEM TO BE SOLVED: To provide a method for forming multilayered optical thin films having optical characteristics of always high accuracy regardless of deposition conditions, etc., and an apparatus for forming the multilayered optical thin films.;SOLUTION: The multilayered optical thin films are formed on a monitor substrate 3 and a crystal oscillator 4 together with a substrate 2. The monitor substrate 3 is irradiated with light, by which at least either of the reflectivity and transmittance of the formed thin films and the film thickness of the formed thin films from the natural oscillation frequency change of the crystal oscillator 4 are detected. The refractive index of the formed thin films is determined from at least either of the detected reflectivity and transmittance and the film thickness. The film thickness of the formed thin films is so controlled as to attain the optimum film thickness at which the multilayered optical thin films are capable of exhibiting the desired optical characteristics according to this refractive index.;COPYRIGHT: (C)2000,JPO