EXPOSURE MASK FOR NEAR-FIELD LIGHT, ITS PRODUCTION, EXPOSURE DEVICE FOR NEAR-FIELD LIGHT AND EXPOSING METHOD USING NEAR-FIELD LIGHT

摘要

PROBLEM TO BE SOLVED: To provide an exposure mask for near-field light which is used to avoid the influences of diffraction of light on the pattern transfer process using light and to localize the near-field light as much as possible to transfer a finer pattern, and to provide its producing method.;SOLUTION: This mask has an integrated laminate structure consisting of a mask substrate 2 such as glass, polarizing layer 4 made of a conductor such as metal and having 100 nm grid line width, bonding layer 6 made, for example, of which has good light-transmitting property and prevents reflection of light, and mask 8 having a metal opening pattern with the min. dimension smaller than the wavelength of light. The thickness of the mask 8 is controlled to twice or smaller than the metal opening width. It is preferable that the mask thickness is made as small as possible.;COPYRIGHT: (C)2000,JPO