首页> 外国专利> GENERATING METHOD OF NEAR-FIELD LIGHT, MASK FOR NEAR-FIELD EXPOSURE, NEAR-FIELD EXPOSING METHOD AND DEVICE, NEAR FIELD LIGHT HEAD, SCANNING NEAR-FIELD OPTICAL MICROSCOPE, AND RECORDING/REPLAYING DEVICE

GENERATING METHOD OF NEAR-FIELD LIGHT, MASK FOR NEAR-FIELD EXPOSURE, NEAR-FIELD EXPOSING METHOD AND DEVICE, NEAR FIELD LIGHT HEAD, SCANNING NEAR-FIELD OPTICAL MICROSCOPE, AND RECORDING/REPLAYING DEVICE

机译:近场光的产生方法,近场照射的掩模,近场曝光方法和装置,近场光头,扫描近场光学显微镜以及记录/重放装置

摘要

PPROBLEM TO BE SOLVED: To provide a method for generating a near-field light which highly efficiently generates the near-field light and also the near-field light having higher intensity, and also to provide a mask for the near-field exposing, the near-field exposing method and device, the nea-field light head, scanning near-field optical microscope, and a recording/replaying device. PSOLUTION: A method for generating a near-field light comprises the steps of: entering a light to microscopic openings having a size of not more than a wavelength of the light; and forming a microscopic light spots in the vicinity of the opening at the light outgoing side of the microscopic opening. In forming the light spots, the microscopic openings are formed in a rectangular shape having vertical and horizontal sizes different from each other to form the light spots having about the same vertical and horizontal sizes with the rectangular-shaped opening. PCOPYRIGHT: (C)2005,JPO&NCIPI
机译:

要解决的问题:提供一种用于产生近场光的方法,该方法可以高效地产生近场光以及具有更高强度的近场光,并且还提供用于该近场的掩模曝光,近场曝光方法和装置,近场光头,扫描近场光学显微镜和记录/重放装置。解决方案:一种用于产生近场光的方法包括以下步骤:将光入射到尺寸不大于光的波长的微观开口中;以及将光入射到具有小于或等于光的波长的微小开口中。在所述微孔的出光侧的所述孔附近形成微光斑。在形成光斑时,将微观开口形成为垂直和水平尺寸彼此不同的矩形形状,以形成与该矩形开口具有大致相同的垂直和水平尺寸的光斑。

版权:(C)2005,JPO&NCIPI

著录项

  • 公开/公告号JP2005101394A

    专利类型

  • 公开/公告日2005-04-14

    原文格式PDF

  • 申请/专利权人 CANON INC;

    申请/专利号JP20030334610

  • 发明设计人 MIZUTANI NATSUHIKO;YAMADA TOMOHIRO;

    申请日2003-09-26

  • 分类号H01L21/027;G01N13/10;G01N13/14;G03F7/20;G11B7/135;

  • 国家 JP

  • 入库时间 2022-08-21 22:32:43

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