首页> 外国专利> EXCIMER LASER BEAM MACHINING DEVICE AND ADJUSTMENT METHOD OF MACHINING ENERGY INTENSUTY OF EXCIMER LASER BEAM

EXCIMER LASER BEAM MACHINING DEVICE AND ADJUSTMENT METHOD OF MACHINING ENERGY INTENSUTY OF EXCIMER LASER BEAM

机译:准分子激光束加工装置及准分子激光束能量强度的调整方法

摘要

PROBLEM TO BE SOLVED: To provide an excimer laser beam machining device of high machining efficiency. SOLUTION: This machine 10 is provided with an oscillator 11 of an excimer laser beam and a mask 14 to regulate the excimer laser beam emitted from the oscillator to a prescribed pattern, and is an excimer laser beam machine to machine a work with the excimer laser beam pattern-regulated by the mask. Further, the device is provided with an angle adjustment jig 16 which holds the work, rotates the work so that a face to be machined of the work is set to a set angle for a radiation direction of the excimer laser beam and positions the face to be machined, and an optical attenuator 54 which is arranged between the oscillator 11 of an excimer laser beam and the mask and attenuates the excimer laser beam with a prescribed attenuation rate in accordance with the relation between an angle of the face to be machined with respect to the radiation direction of the excimer laser beam and a required energy of the excimer laser beam based on the set angle of the face to be machined for the radiation direction of the excimer laser beam.
机译:要解决的问题:提供一种高加工效率的准分子激光束加工装置。解决方案:该机器10配备有准分子激光束的振荡器11和用于将振荡器发出的准分子激光调节到预定图案的掩模14,并且是一种准分子激光束机器,用于利用准分子激光加工工件光束图案由遮罩调节。此外,该装置设置有角度调整夹具16,该角度调整夹具16保持工件,旋转工件,从而将工件的待加工面设置为针对准分子激光束的辐射方向的设定角度,并将该面定位为光学衰减器54,其布置在准分子激光束的振荡器11和掩模之间,并且根据待加工的面相对于角度的关系以规定的衰减率衰减准分子激光束。准分子激光束的辐射方向和准分子激光束的所需能量基于待加工面的准分子激光束的辐射方向的角度来确定。

著录项

  • 公开/公告号JP2000271770A

    专利类型

  • 公开/公告日2000-10-03

    原文格式PDF

  • 申请/专利权人 SONY CORP;

    申请/专利号JP19990079818

  • 申请日1999-03-24

  • 分类号B23K26/02;B23K26/00;B23K26/06;B23K26/08;H01S3/00;H01S3/10;

  • 国家 JP

  • 入库时间 2022-08-22 02:01:12

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