首页> 外国专利> METHOD FOR CORRECTING OPTICAL WAVE ABERRATION IN OPTICAL SYSTEM, AND OPTICAL SYSTEM AND MICROSCOPE MANUFACTURED BASED ON IT

METHOD FOR CORRECTING OPTICAL WAVE ABERRATION IN OPTICAL SYSTEM, AND OPTICAL SYSTEM AND MICROSCOPE MANUFACTURED BASED ON IT

机译:光学系统中光像差的校正方法,以及基于该方法的光学系统和微镜制造

摘要

PROBLEM TO BE SOLVED: To provide a method for correcting optical wave aberration in an optical system, and the optical system and a microscope manufactured based on this method. ;SOLUTION: In this method an optical wave surface for the various kinds of wavelength and visual fields between an entrance pupil EP and an exit pupil AP is calculated and phase difference existing according to circumstances is compensated by at least one surface 5 or 7 exerting an effect on phase in an optical path. Besides, this microscope is constituted so that the axial line A of the first reflector 3 thereof forms an angle α deviated from the optical axis O and from 0°.;COPYRIGHT: (C)2000,JPO
机译:解决的问题:提供一种用于校正光学系统中的光波像差的方法,以及基于该方法制造的光学系统和显微镜。 ;解决方案:在这种方法中,计算入射光瞳EP和出射光瞳AP之间各种波长和视野的光波表面,并通过至少一个表面5或7施加一个对光路相位的影响。此外,该显微镜被构造成使得其第一反射器3的轴线A形成偏离光轴O并且偏离0°的角度α。;版权:(C)2000,JPO

著录项

  • 公开/公告号JP2000235151A

    专利类型

  • 公开/公告日2000-08-29

    原文格式PDF

  • 申请/专利权人 LEICA GEOSYSTEMS AG;

    申请/专利号JP20000035981

  • 发明设计人 MASSIMO BEAVER;BERNHARD BRAUNECKER;

    申请日2000-02-14

  • 分类号G02B23/02;G02B17/00;

  • 国家 JP

  • 入库时间 2022-08-22 02:00:29

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