MAPPING TYPE OBSERVATION METHOD AND MAPPING TYPE CHARGED PARTICLE BEAM MICROSCOPE

摘要

PROBLEM TO BE SOLVED: To reduce influences of an unevenness of an electron beam intensity distribution in an observation visual field and an unevenness of a detection sensitivity distribution in an electron detection system to further certainly observe a sample. ;SOLUTION: First, a lighting condition and an image forming condition for observing a sample 8 are set. Under the conditions, a reference sample 8A having an even surface shape is put on an X-Y stage 9, and then, an image in a prescribed area of the reference sample 8A is picked up through an electron detection system 21 and the like. This obtained image signal is stored in a memory part 18A as a reference image signal. Next, the sample 8 is put on the X-Y stage 9, and an image in a visual field 28 of the sample 8 is picked up. This obtained image signal is output to an image signal calculation part 19 as a sample image signal. The sample image signal is divided by the reference image signal so that influences of an electron beam intensity distribution and the like on the sample image signal is corrected. The corrected sample image signal is binarized according to a prescribed threshold level or the like so as to be output to an output device 20.;COPYRIGHT: (C)2000,JPO