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An apparatus and method for by means of vapor deposition (PVD) on objects application of a layer.

机译:一种通过气相沉积(PVD)在物体上施加层的设备和方法。

摘要

The invention relates to an apparatus (1) for applying at least one coating to objects by means of vapour deposition (PVD) under vacuum, comprising: a preprocessing device (3) for performing a preprocessing on the object; a PVD device (2) for coating an object under a vacuum; and a postprocessing device (4) for postprocessing the objects, wherein: the apparatus comprises a transport device (5) which extends through the preprocessing device, the PVD device and the postprocessing device, the transport device is adapted to transport objects arranged on carriers, and the PVD device is adapted for semi-continuous treatment of objects arranged on the carriers.
机译:本发明涉及一种用于在真空下通过气相沉积(PVD)将至少一个涂层施加到物体上的装置(1),该装置包括:预处理装置(3),用于对该物体进行预处理;用于在真空下涂覆物体的PVD装置(2);以及用于对所述物体进行后处理的后处理装置(4),其中:所述装置包括延伸穿过所述预处理装置,所述PVD装置和所述后处理装置的运输装置(5),所述运输装置适于运输布置在载体上的物体,该PVD设备适于半连续处理布置在载体上的物体。

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