DEVICE FABRICATION ENTAILING SYNCHROTRON RADIATION

摘要

Devices built to design rules ~0.25µm are pattern delineated by use ofsynchrotron-emitted x-ray radiation using a condenser which collects over acollection arc of at lease 100 mrad. Condenser designs provide for processingofcollected radiation to tailor characteristics such as direction anddivergence. Patterndelineation by proximity printing as well as by projection printing isdescribed.Forms of projection printing include reduction ringfield projection as by 5:1mask:image reduction.