SOL-GEL PREPARATION OF SILICA OR SILICA-BASED VITREOUS FILMS

摘要

It is described a sol-gel process allowing the preparation, on a substrate, of glassy films of silicon oxide or mixed oxides based on silicon oxide, of thickness above 1 micrometer, generally between 2 and 20 micrometers, and characterised by absence of defects, that turn out to be particularly suitab le as waveguides in flat optical devices.