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CdTe CRYSTAL OR CdZnTe CRYSTAL AND METHOD FOR PREPARING THE SAME

机译:CdTe晶体或CdZnTe晶体及其制备方法

摘要

An object of the present invention is to reduce the etch pit density (EPD) and the full-width-half-maximum (FWHM) value of the double crystal X-ray rocking curve, and to provide a CdTe crystal or a CdZnTe crystal which does not include deposits having Cd or Te and the process for producing the same. After a CdTe crystal or a CdZnTe crystal was grown, while the temperature of the crystal is from 700 to 1050 DEG C, the Cd pressure is adjusted so as to keep the stoichiometry of the crystal at the above temperature. The crystal is left for time t which is determined so that each of a diameter L(r) of the crystal and a length L(z) thereof satisfies the following equation 1: MATH Then, when the crystal is cooled, the temperature of the crystal is decreased within a range in which the temperature of the crystal and that of a Cd reservoir satisfy the following equation 2: MATH
机译:本发明的目的是降低双晶X射线摇摆曲线的刻蚀坑密度(EPD)和半峰全宽(FWHM)值,并提供一种CdTe晶体或CdZnTe晶体,其不包括具有Cd或Te的矿床及其生产工艺。在生长CdTe晶体或CdZnTe晶体之后,在晶体温度为700至1050℃的同时,调节Cd压力以将晶体的化学计量保持在上述温度。将晶体放置时间t,该时间确定为使晶体的直径L(r)和长度L(z)均满足以下方程式1:然后,当晶体冷却时,温度在晶体和Cd储库的温度满足以下方程式2的范围内,晶体的结晶度降低:

著录项

  • 公开/公告号EP1022772A4

    专利类型

  • 公开/公告日2000-08-16

    原文格式PDF

  • 申请/专利权人 JAPAN ENERGY CORPORATION;

    申请/专利号EP19990913658

  • 发明设计人 HIRANO RYUICHI;KOYAMA AKIO;

    申请日1999-04-14

  • 分类号H01L21/368;C30B33/00;C30B29/48;C30B11/00;

  • 国家 EP

  • 入库时间 2022-08-22 01:47:10

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