Sterilizing composition for manufacturing high-purity water for using semiconductor device fabrication and sterilizing method of high-purity water manufacturing apparatus by using the sterilizing composition

摘要

PURPOSE: A method for sterilizing ultrapure water is provided to strictly manage generation of organic contaminants due to microorganisms over a certain level and obtain an optimum effect while minimizing time loss. CONSTITUTION: A method for sterilizing ultrapure water sterilizes polishers by supplying heat water into an organic polisher(14) and a mixed polisher(15) in an ultrapure water manufacture apparatus comprising a pure water supply tank(11), a thermal exchanger(12), an ultraviolet sterilizer(13), an organic polisher(14) and a mixed polisher(15) and a filter(16). Pure water is circulated into the pure water supply tank(11), a thermal exchanger(12), an ultraviolet sterilizer(13) and the filter(16) by going around the polishers. Pure water contains sterilizing compositions composed of hydrogen peroxide, peracetic acid and deionized water.