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Sterilizing composition for making ultrapure water in the semiconductor devices fabrication process, method of sterilizing a ultrapure water delivery system
Sterilizing composition for making ultrapure water in the semiconductor devices fabrication process, method of sterilizing a ultrapure water delivery system
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机译:用于在半导体器件制造过程中制造超纯水的灭菌组合物,对超纯水输送系统进行灭菌的方法
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摘要
Compositions for making ultrapure water in microelectronic device fabrication processes comprise hydrogen peroxide, peracetic acid, and water. Methods of sterilizing ultrapure water delivery systems for use in microelectronic device fabrication processes comprise contacting ultrapure water delivery systems with water having temperatures ranging from about 26 DEG C. to about 40 DEG C.; and sterilizing the ultrapure water delivery systems with compositions comprising hydrogen peroxide, peracetic acid, and water. The ultrapure water delivery systems comprise water tanks, heat exchangers in fluid communication with the water tanks, ultraviolet sterilizers in fluid communication with the heat exchangers, OR-polishers in fluid communication with the ultraviolet sterilizers, MB-polishers in fluid communication with the OR-polishers, and ultrafilters in fluid communication with the OR-polishers. The compositions employed in the sterilizing step do not contact the OR-polishers and the MB-polishers.
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