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AN IMPURITY CONCENTRATOR AND A METHOD FOR CONCENTRATING IMPURITY, AN IMPURITY ANALYZER AND A METHOD FOR ANALYZING IMPURITY

机译:杂质浓缩器和杂质浓缩方法,杂质分析仪和杂质分析方法

摘要

The present invention provides a method for concentrating impurities contained in a semiconductor crystal sample 11 by repeatedly irradiating a predetermined position of the semiconductor crystal sample 11 with a laser beam having a predetermined intensity by the laser oscillator 13. do. The present invention also provides a method for analyzing impurities contained in an impurity concentration region of the semiconductor crystal sample 11 with high sensitivity by predetermined physical analysis means. According to the demand, the method of the present invention forms an insulating film such as an oxide film and then concentrates the impurities by the laser light by irradiating the laser light onto the surface of the semiconductor crystal sample. At the same time, the present invention provides a concentration apparatus and an analysis apparatus using these concentration methods and analysis methods.
机译:本发明提供了一种方法,该方法通过用激光振荡器13do以预定强度的激光束重复照射半导体晶体样品11的预定位置来浓缩半导体晶体样品11中包含的杂质。本发明还提供一种通过预定的物理分析装置以高灵敏度分析半导体晶体样品11的杂质浓度区域中包含的杂质的方法。根据需要,本发明的方法形成诸如氧化膜的绝缘膜,然后通过将激光照射到半导体晶体样品的表面上而通过激光来浓缩杂质。同时,本发明提供了使用这些浓缩方法和分析方法的浓缩装置和分析装置。

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